Influence of nitrogen implantation on the properties of Ti and substoichiometric TiNx films deposited on high speed steel

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URI: https://hdl.handle.net/11556/4495
ISSN: 0884-2914
DOI: 10.1557/JMR.1998.0296
Publication date
1998-08
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Abstract
Ti and TiNx (x < 1) thin films have been deposited on high speed steel (HSS) substrates by reactive sputtering and then N+ implanted. The increase of the N/Ti ratio of the films during deposition is related to a decrease in their roughness, and N+ implantation produces another additional slight decrease of the roughness. The hardness of samples increases with the nitrogen content in the as-deposited samples; nevertheless, N+-implanted Ti coatings show lower values of hardness than reactive sputtered TiNx films. α-Ti, ∈-Ti2N, and δ-TiN phases were identified by grazing x-ray diffraction.
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General Materials Science , Condensed Matter Physics , Mechanics of Materials , Mechanical Engineering
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journal article
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Rodrigo , M T , Jiménez , C , Vázquez , L , Alonso , F , Fernández , M & Martínez-Duart , J M 1998 , ' Influence of nitrogen implantation on the properties of Ti and substoichiometric TiN x films deposited on high speed steel ' , Journal of Materials Research , vol. 13 , no. 8 , pp. 2117-2122 . https://doi.org/10.1557/JMR.1998.0296