RT Journal Article
T1 Influence of nitrogen implantation on the properties of Ti and substoichiometric TiNx films deposited on high speed steel
A1 Rodrigo, M. T.
A1 Jiménez, C.
A1 Vázquez, L.
A1 Alonso, F.
A1 Fernández, M.
A1 Martínez-Duart, J. M.
AB Ti and TiNx (x < 1) thin films have been deposited on high speed steel (HSS) substrates by reactive sputtering and then N+ implanted. The increase of the N/Ti ratio of the films during deposition is related to a decrease in their roughness, and N+ implantation produces another additional slight decrease of the roughness. The hardness of samples increases with the nitrogen content in the as-deposited samples; nevertheless, N+-implanted Ti coatings show lower values of hardness than reactive sputtered TiNx films. α-Ti, ∈-Ti2N, and δ-TiN phases were identified by grazing x-ray diffraction.
SN 0884-2914
YR 1998
FD 1998-08
LK https://hdl.handle.net/11556/4495
UL https://hdl.handle.net/11556/4495
LA eng
NO Rodrigo , M T , Jiménez , C , Vázquez , L , Alonso , F , Fernández , M & Martínez-Duart , J M 1998 , ' Influence of nitrogen implantation on the properties of Ti and substoichiometric TiN x films deposited on high speed steel ' , Journal of Materials Research , vol. 13 , no. 8 , pp. 2117-2122 . https://doi.org/10.1557/JMR.1998.0296
DS TECNALIA Publications
RD 29 jul 2024