Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography
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2005-11
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We present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsystems by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.
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Bilenberg , B , Hansen , M , Johansen , D , Özkapici , V , Jeppesen , C , Szabo , P , Obieta , I M , Arroyo , O , Tegenfeldt , J O & Kristensen , A 2005 , ' Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography ' , Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol. 23 , no. 6 , pp. 2944-2949 . https://doi.org/10.1116/1.2091089