Compact LED based nanoimprinter for UV-NIL

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URI: https://hdl.handle.net/11556/4004
ISSN: 0167-9317
DOI: 10.1016/j.mee.2011.06.023
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2011-11
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Abstract
UV-based nanoimprint lithography (UV-NIL) is a cheap and fast way to imprint patterns ranging from nanometres to micrometres. However, commonly used equipment can be expensive and require a clean room infrastructure. Here we present the design and testing of a simple UV-NIL system based on a light emitting diode. The current design permits imprints of 10 × 10 mm 2 in size using a 25 × 25 mm2 master. This printer can be used in a semi-clean environment such as a laminar flow bench. The imprinter was used to imprint photoresists as well as UV sensitised hydrogels. The best results were obtained using SU-8 photoresist with features down to 50 nm in size, only limited by the imprint master. Patterns in SU-8 resist were also transferred into silicon substrates by reactive ion etching demonstrating its full potential as a lithographic tool.
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LED , Nanoimprint , SU-8 , UV-NIL , Electronic, Optical and Magnetic Materials , Atomic and Molecular Physics, and Optics , Condensed Matter Physics , Surfaces, Coatings and Films , Electrical and Electronic Engineering
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journal article
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Khokhar , A Z , Gaston , A , Obieta , I & Gadegaard , N 2011 , ' Compact LED based nanoimprinter for UV-NIL ' , Microelectronic Engineering , vol. 88 , no. 11 , pp. 3347-3352 . https://doi.org/10.1016/j.mee.2011.06.023