%0 Journal Article
%A Khokhar, Ali Z.
%A Gaston, Ainhoa
%A Obieta, Isabel
%A Gadegaard, Nikolaj
%T Compact LED based nanoimprinter for UV-NIL
%D 2011
%@ 0167-9317
%U https://hdl.handle.net/11556/4004
%X UV-based nanoimprint lithography (UV-NIL) is a cheap and fast way to imprint patterns ranging from nanometres to micrometres. However, commonly used equipment can be expensive and require a clean room infrastructure. Here we present the design and testing of a simple UV-NIL system based on a light emitting diode. The current design permits imprints of 10 × 10 mm 2 in size using a 25 × 25 mm2 master. This printer can be used in a semi-clean environment such as a laminar flow bench. The imprinter was used to imprint photoresists as well as UV sensitised hydrogels. The best results were obtained using SU-8 photoresist with features down to 50 nm in size, only limited by the imprint master. Patterns in SU-8 resist were also transferred into silicon substrates by reactive ion etching demonstrating its full potential as a lithographic tool.
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