RT Journal Article
T1 Compact LED based nanoimprinter for UV-NIL
A1 Khokhar, Ali Z.
A1 Gaston, Ainhoa
A1 Obieta, Isabel
A1 Gadegaard, Nikolaj
AB UV-based nanoimprint lithography (UV-NIL) is a cheap and fast way to imprint patterns ranging from nanometres to micrometres. However, commonly used equipment can be expensive and require a clean room infrastructure. Here we present the design and testing of a simple UV-NIL system based on a light emitting diode. The current design permits imprints of 10 × 10 mm 2 in size using a 25 × 25 mm2 master. This printer can be used in a semi-clean environment such as a laminar flow bench. The imprinter was used to imprint photoresists as well as UV sensitised hydrogels. The best results were obtained using SU-8 photoresist with features down to 50 nm in size, only limited by the imprint master. Patterns in SU-8 resist were also transferred into silicon substrates by reactive ion etching demonstrating its full potential as a lithographic tool.
SN 0167-9317
YR 2011
FD 2011-11
LK https://hdl.handle.net/11556/4004
UL https://hdl.handle.net/11556/4004
LA eng
NO Khokhar , A Z , Gaston , A , Obieta , I & Gadegaard , N 2011 , ' Compact LED based nanoimprinter for UV-NIL ' , Microelectronic Engineering , vol. 88 , no. 11 , pp. 3347-3352 . https://doi.org/10.1016/j.mee.2011.06.023
NO The authors acknowledge technical assistance in the James Watt Nanofabrication Centre at Glasgow and the mechanical work shop in the School of Engineering. The work has been supported by the EC funded project NaPANIL (Contract No. FP7-CP-IP 214249-2).
DS TECNALIA Publications
RD 29 sept 2024