RT Journal Article T1 Attrition-resistant membranes for fluidized-bed membrane reactors: Double-skin membranes: Double-skin membranes A1 Arratibel, Alba A1 Medrano, Jose Antonio A1 Melendez, Jon A1 Pacheco Tanaka, D. Alfredo A1 van Sint Annaland, Martin A1 Gallucci, Fausto AB Pd-Ag supported membranes have been prepared by coating a ceramic interdiffusion barrier onto a Hastelloy X (0.2 µm media grade) porous support followed by deposition of the hydrogen selective Pd-Ag (4–5 µm) layer by electroless plating. To one of the membranes an additional porous Al2O3-YSZ layer (protective layer with 50 wt% of YSZ) was deposited by dip-coating followed by calcination at 550 °C on top of the Pd-Ag layer, and this membrane is referred to as a double-skin membrane. Both membranes were integrated at the same time in a single reactor in order to assess and compare the performance of both membranes under identical conditions. The membranes have first been tested in an empty reactor with pure gases (H2 and N2) and afterwards in the presence of a catalyst (rhodium onto promoted alumina) fluidized in the bubbling regime. The membranes immersed in the bubbling bed were tested at 400 °C and 500 °C for 115 and 500 h, respectively. The effect of the protective layer on the permeation properties and stability of the membranes were studied. The double-skinned membraned showed a H2 permeance of 1.55·10−6 mol m−2 s−1 Pa−1 at 500 °C and 4 bar of pressure difference with an ideal perm-selectivity virtually infinite before incorporation of particles. This selectivity did not decay during the long term test under fluidization with catalyst particles. SN 0376-7388 YR 2018 FD 2018-10-01 LA eng NO Arratibel , A , Medrano , J A , Melendez , J , Pacheco Tanaka , D A , van Sint Annaland , M & Gallucci , F 2018 , ' Attrition-resistant membranes for fluidized-bed membrane reactors: Double-skin membranes : Double-skin membranes ' , Journal of Membrane Science , vol. 563 , pp. 419-426 . https://doi.org/10.1016/j.memsci.2018.06.012 NO Publisher Copyright: © 2018 Elsevier B.V. DS TECNALIA Publications RD 29 jun 2024