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dc.contributor.authorLópez-Cartes, C.
dc.contributor.authorMartínez-Martínez, D.
dc.contributor.authorSánchez-López, J.C.
dc.contributor.authorFernández, A.
dc.contributor.authorGarcía-Luis, A.
dc.contributor.authorBrizuela, Marta
dc.contributor.authorOnate, J.I.
dc.date.accessioned2015-07-22T09:11:36Z
dc.date.available2015-07-22T09:11:36Z
dc.date.issued2007-02-26
dc.identifier.citationThin Solid Films Vol 515, 2007, Issues 7–8, Pp. 3590–3596en
dc.identifier.issn0040-6090en
dc.identifier.urihttp://hdl.handle.net/11556/38
dc.description.abstractA series of Ti–B–(N) coatings prepared by dc magnetron sputtering using TiB2 targets in Ar/N2 gas mixtures has been chemically and structurally characterized by transmission electron microscopy, X-ray diffraction, electron energy-loss spectroscopy, and X-ray photoelectron spectroscopy. The influence of synthesis parameters such as applied heating power and nitrogen flow on the structure and chemical composition of the coatings has been studied. Independently of the experimental conditions employed during the synthesis, hexagonal TiB2 is the main crystalline phase present in the coatings. The use of N2 leads to the formation of an amorphous mixture of BN/TiN phases, as well as a diminution of the TiB2 crystalline phase. The influence of the composition and structure of the coatings on their hardness is also discussed.en
dc.description.sponsorshipSpanish Ministry of Science and Education (Project references: MAT2001–1399/C02–01/02 and MAT2004–01052) CSIC (Program I3P).en
dc.language.isoengen
dc.publisherElsevieren
dc.titleCharacterization of nanostructured Ti–B–(N) coatings produced by direct current magnetron sputteringen
dc.typejournal articleen
dc.identifier.doi10.1016/j.tsf.2006.11.013en
dc.isiYesen
dc.rights.accessRightsembargoed accessen
dc.subject.keywordsTi–B–(N)en
dc.subject.keywordsTransmission electron microscopyen
dc.subject.keywordsX-ray photoelectron spectroscopyen
dc.subject.keywordsSputteringen
dc.subject.keywordsElectron energy-loss spectroscopyen


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